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铁电畴壁的动态电导率在 BiFeO₃ 中的研究。

Dynamic conductivity of ferroelectric domain walls in BiFeO₃.

机构信息

Center for Nanophase Materials Sciences, Oak Ridge National Laboratory, Oak Ridge, Tennessee 37831, United States.

出版信息

Nano Lett. 2011 May 11;11(5):1906-12. doi: 10.1021/nl104363x. Epub 2011 Apr 12.

Abstract

Topological walls separating domains of continuous polarization, magnetization, and strain in ferroic materials hold promise of novel electronic properties, that are intrinsically localized on the nanoscale and that can be patterned on demand without change of material volume or elemental composition. We have revealed that ferroelectric domain walls in multiferroic BiFeO(3) are inherently dynamic electronic conductors, closely mimicking memristive behavior and contrary to the usual assumption of rigid conductivity. Applied electric field can cause a localized transition between insulating and conducting domain walls, tune domain wall conductance by over an order of magnitude, and create a quasicontinuous spectrum of metastable conductance states. Our measurements identified that subtle and microscopically reversible distortion of the polarization structure at the domain wall is at the origin of the dynamic conductivity. The latter is therefore likely to be a universal property of topological defects in ferroelectric semiconductors.

摘要

铁电材料中分离连续极化、磁化和应变畴的拓扑壁有望产生新的电子特性,这些特性本质上是纳米尺度上的局域特性,并且可以按需进行图案化,而不会改变材料的体积或元素组成。我们已经揭示出多铁性 BiFeO(3)中的铁电畴壁本质上是动态的电子导体,其行为与通常假设的刚性电导率非常相似,与忆阻行为非常相似。外加电场可以引起绝缘和导电畴壁之间的局部转变,将畴壁电导调节一个数量级以上,并产生准连续的亚稳电导状态谱。我们的测量结果表明,畴壁处的极化结构的细微和微观可逆变形是动态电导率的起源。因此,后者很可能是铁电半导体中拓扑缺陷的普遍特性。

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