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铁电畴壁中 BiFeO 的局部光伏电流增强

Enhancement of Local Photovoltaic Current at Ferroelectric Domain Walls in BiFeO.

机构信息

Department of Physics, University of Warwick, Coventry, CV4 7AL, United Kingdom.

Centre for Innovation Competence SiLi-Nano, Karl-Freiherr-von-Fritsch-Straße 3, D-06120 Halle (Saale), Germany.

出版信息

Sci Rep. 2017 Feb 20;7:43070. doi: 10.1038/srep43070.

Abstract

Domain walls, which are intrinsically two dimensional nano-objects exhibiting nontrivial electronic and magnetic behaviours, have been proven to play a crucial role in photovoltaic properties of ferroelectrics. Despite this recognition, the electronic properties of domain walls under illumination until now have been accessible only to macroscopic studies and their effects upon the conduction of photovoltaic current still remain elusive. The lack of understanding hinders the developing of nanoscale devices based on ferroelectric domain walls. Here, we directly characterize the local photovoltaic and photoconductive properties of 71° domain walls on BiFeO thin films with a nanoscale resolution. Local photovoltaic current, proven to be driven by the bulk photovoltaic effect, has been probed over the whole illuminated surface by using a specially designed photoelectric atomic force microscopy and found to be significantly enhanced at domain walls. Additionally, spatially resolved photoconductive current distribution reveals a higher density of excited carriers at domain walls in comparison with domains. Our measurements demonstrate that domain wall enhanced photovoltaic current originates from its high conduction rather than the internal electric field. This photoconduction facilitated local photovoltaic current is likely to be a universal property of topological defects in ferroelectric semiconductors.

摘要

畴壁是具有本征二维纳米结构的纳米物体,表现出非平凡的电子和磁学行为,已被证明在铁电体的光伏性能中起着至关重要的作用。尽管人们已经认识到这一点,但直到现在,光照下畴壁的电子特性只能通过宏观研究来研究,其对光伏电流传导的影响仍然难以捉摸。这种缺乏理解阻碍了基于铁电畴壁的纳米尺度器件的发展。在这里,我们直接用纳米级分辨率对 BiFeO 薄膜上的 71°畴壁的局部光伏和光电导性质进行了表征。通过使用专门设计的光电原子力显微镜,在整个光照表面上探测到了由体光伏效应驱动的局部光伏电流,并证实其在畴壁处显著增强。此外,空间分辨光电导电流分布显示,与畴相比,畴壁处的激发载流子密度更高。我们的测量表明,畴壁增强的光伏电流源于其高导电性,而不是内部电场。这种光电导促进的局部光伏电流很可能是铁电半导体中拓扑缺陷的普遍特性。

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