National Institute of Standards and Technology, Gaithersburg, Maryland 20899, USA.
Opt Lett. 2011 May 15;36(10):1899-901. doi: 10.1364/OL.36.001899.
A method for fabricating binary amplitude holograms from a dyed photoresist is described. It is of particular interest for holograms that are used as null optics in the form metrology of aspheric surfaces and wavefronts. A pigment that strongly absorbs light near 633 nm was dissolved in a positive photoresist and the dyed resist was spun onto silica glass substrates. Stable resist layers were obtained that were essentially opaque at 633 nm with little effect on the transmittance of the resist in the UV. A Fresnel zone plate was fabricated from the dyed resist layer using contact lithography, and its performance was demonstrated at 633 nm.
描述了一种从染色光致抗蚀剂中制作二元振幅全息图的方法。对于作为非球面和波前形式计量学中的零光程的全息图，该方法特别有意义。将在 633nm 附近强烈吸收光的颜料溶解在正性光致抗蚀剂中，并将染色的抗蚀剂旋涂到石英玻璃基底上。得到的稳定的抗蚀剂层在 633nm 处基本上是不透明的，对 UV 区的抗蚀剂的透过率几乎没有影响。使用接触光刻法从染色的抗蚀剂层中制作了菲涅耳波带片，并在 633nm 处演示了其性能。
