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关于二氧化钒薄膜中跨相变边界的红外反射率和光发射光谱研究。

Infrared reflectance and photoemission spectroscopy studies across the phase transition boundary in thin film vanadium dioxide.

作者信息

Ruzmetov Dmitry, Zawilski Kevin T, Senanayake Sanjaya D, Narayanamurti Venkatesh, Ramanathan Shriram

机构信息

Harvard School of Engineering and Applied Sciences, Harvard University, Cambridge, MA 02138, USA.

出版信息

J Phys Condens Matter. 2008 Nov 19;20(46):465204. doi: 10.1088/0953-8984/20/46/465204. Epub 2008 Oct 21.

Abstract

Optical properties and valence band density of states near the Fermi level of high-quality VO(2) thin films have been investigated by mid-infrared reflectometry and hard-UV (hν = 150 eV) photoemission spectroscopy. An exceptionally large change in reflectance from 2 to 94% is found upon the thermally driven metal-insulator transition (MIT). The infrared dispersion spectra of the reflectance across the MIT are presented and evidence for the percolative nature of the MIT is pointed out. The discrepancy between the MIT temperatures defined from the electrical and optical properties is found and its origin is discussed. The manifestation of the MIT is observed in the photoemission spectra of the V 3d levels. The analysis of the changes of the V 3d density of states is done and the top valence band shift upon the MIT is measured to be 0.6 eV.

摘要

通过中红外反射光谱和硬紫外(hν = 150 eV)光电子能谱研究了高质量VO(2)薄膜在费米能级附近的光学性质和价带态密度。在热驱动的金属-绝缘体转变(MIT)过程中,发现反射率有从2%到94%的异常大幅变化。给出了MIT过程中反射率的红外色散光谱,并指出了MIT渗流性质的证据。发现了由电学和光学性质定义的MIT温度之间的差异,并讨论了其起源。在V 3d能级的光电子能谱中观察到了MIT的表现。对V 3d态密度的变化进行了分析,测得MIT过程中最高价带的位移为0.6 eV。

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