Department of Electrical Engineering and Computer Science, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139, USA.
Langmuir. 2011 Aug 2;27(15):9073-6. doi: 10.1021/la2016929. Epub 2011 Jun 28.
We demonstrate that "contact patterning" subtractively patterns a wide range of molecular organic films of nanoscale thickness with nanometer-scale accuracy. In "contact patterning", an elastomeric stamp with raised features is brought into contact with the organic film and subsequently removed, generating patterns by the diffusion of the film molecules into the stamp. The mechanism of material removal via diffusion is documented over spans of minutes, hours, and days and is shown to be consistently repeatable. Contact patterning provides a photolithography-free, potentially scalable approach to subtractive patterning of a wide range of molecular organic films.
我们证明了“接触图案化”可以减去各种纳米级厚度的分子有机薄膜，并具有纳米级的精度。在“接触图案化”中，具有凸起特征的弹性印章与有机薄膜接触，然后将其移除，通过薄膜分子扩散到印章中生成图案。通过扩散去除材料的机制在几分钟、几小时和几天的时间跨度内得到记录，并证明其具有一致性和可重复性。接触图案化提供了一种无光刻、潜在可扩展的方法，可用于对各种分子有机薄膜进行减法图案化。
