Zhao Fei, Cheng Guo-An, Zheng Rui-Ting, Zhao Dan-Dan, Wu Shao-Long, Deng Jian-Hua
Key Laboratory of Beam Technology and Material Modification of Ministry of Education, College of Nuclear Science and Technology, Beijing Normal University, Beijing 100875, P, R, China.
Nanoscale Res Lett. 2011 Feb 25;6(1):176. doi: 10.1186/1556-276X-6-176.
Au-Si nano-particle-decorated silicon nanowire arrays have been fabricated by Au film deposition on silicon nanowire array substrates and then post-thermal annealing under hydrogen atmosphere. Field emission measurements illustrated that the turn-on fields of the non-annealed Au-coated SiNWs were 6.02 to 7.51 V/μm, higher than that of the as-grown silicon nanowires, which is about 5.01 V/μm. Meanwhile, after being annealed above 650°C, Au-Si nano-particles were synthesized on the top surface of the silicon nanowire arrays and the one-dimensional Au-Si nano-particle-decorated SiNWs had a much lower turn-on field, 1.95 V/μm. The results demonstrated that annealed composite silicon nanowire array-based electron field emitters may have great advantages over many other emitters.
通过在硅纳米线阵列衬底上沉积金膜,然后在氢气气氛下进行后热退火,制备了金硅纳米颗粒修饰的硅纳米线阵列。场发射测量表明,未退火的金包覆硅纳米线的开启场为6.02至7.51 V/μm,高于生长态硅纳米线的开启场,生长态硅纳米线的开启场约为5.01 V/μm。同时,在650°C以上退火后,在硅纳米线阵列的顶表面合成了金硅纳米颗粒,一维金硅纳米颗粒修饰的硅纳米线具有低得多的开启场,为1.95 V/μm。结果表明,退火后的复合硅纳米线阵列基电子场发射体可能比许多其他发射体具有很大优势。