Ghose Debabrata
Saha Institute of Nuclear Physics, Sector-I, Block-AF, Bidhan Nagar, Kolkata 700064, India.
J Phys Condens Matter. 2009 Jun 3;21(22):224001. doi: 10.1088/0953-8984/21/22/224001. Epub 2009 May 12.
The development of fine scale nanostructures in polycrystalline metal films by off-normal ion beam sputtering (IBS) follows similar mechanisms to those in random targets, i.e. the pattern results from the interplay of curvature-dependent-roughening and various smoothing processes. By grazing angle IBS of the deposited metal films it is possible to fabricate metallic nanoripples, nanowires, and nanorods onto semiconductor or insulator substrates without using a template. It has been found that the rms roughness of the as-deposited film is substantially reduced under ion bombardment before the development of nanoscale patterns. The structural anisotropy of the sputtered morphology can have a great influence on the local physical properties of the underlying material. In this paper, we shall review the experimental results on the formation and characteristics of the IBS ripples on polycrystalline metal films prepared by the physical vapor deposition (PVD) technique.
通过离法线离子束溅射（IBS）在多晶金属薄膜中形成精细尺度纳米结构的过程，与在随机靶材中的过程遵循相似的机制，即该图案是由曲率相关的粗糙化和各种平滑过程相互作用产生的。通过对沉积金属薄膜进行掠角离子束溅射，无需使用模板就可以在半导体或绝缘体衬底上制备金属纳米波纹、纳米线和纳米棒。已经发现，在纳米尺度图案形成之前，沉积薄膜的均方根粗糙度在离子轰击下会大幅降低。溅射形貌的结构各向异性会对下层材料的局部物理性质产生很大影响。在本文中，我们将综述通过物理气相沉积（PVD）技术制备的多晶金属薄膜上离子束溅射波纹的形成及特性的实验结果。
