Khun N W, Liu E
School of Mechanical and Aerospace Engineering, Nanyang Technological University, 50 Nanyang Avenue, Singapore 639798, Singapore.
J Nanosci Nanotechnol. 2011 Jun;11(6):5305-10. doi: 10.1166/jnn.2011.3789.
Nitrogen doped diamond-like carbon thin films were deposited on highly conductive p-silicon(100) substrates using a DC magnetron sputtering deposition system by varying working pressure in the deposition chamber. The bonding structure, adhesion strength, surface roughness and corrosion behavior of the films were investigated by using X-ray photoelectron spectroscopy, micro-Raman spectroscopy, micro-scratch test, atomic force microscopy and potentiodynamic polarization test. A 0.6 M NaCl electrolytic solution was used for the corrosion tests. The optimum corrosion resistance of the films was found at a working pressure of 7 mTorr at which a good balance between the kinetics of the sputtered ions and the surface mobility of the adatoms promoted a microstructure of the films with fewer porosities.
采用直流磁控溅射沉积系统，通过改变沉积室中的工作压力，在高导电性的p型硅（100）衬底上沉积了氮掺杂类金刚石碳薄膜。利用X射线光电子能谱、显微拉曼光谱、微划痕试验、原子力显微镜和动电位极化试验研究了薄膜的键合结构、附着力、表面粗糙度和腐蚀行为。腐蚀试验采用0.6M NaCl电解液。在7毫托的工作压力下发现薄膜具有最佳的耐腐蚀性，此时溅射离子的动力学与吸附原子的表面迁移率之间达到了良好的平衡，促进了孔隙较少的薄膜微观结构的形成。
