Kaunas University of Technology, Institute of Materials Science , K. Baršausko Street 59 , LT-51423 Kaunas , Lithuania.
Mads Clausen Institute, NanoSYD , Alsion 2 , DK-6400 Sønderborg , Denmark.
ACS Appl Mater Interfaces. 2018 May 9;10(18):15778-15785. doi: 10.1021/acsami.7b17439. Epub 2018 Apr 24.
Piezoresistive properties of hydrogenated diamond-like carbon (DLC) and DLC-based nickel nanocomposite (DLC:Ni) films were studied in the range of low concentration of nickel nanoparticles. The films were deposited by reactive high power pulsed magnetron sputtering (HIPIMS) of Ni target, and some samples were deposited by direct current (dc) reactive magnetron sputtering for comparison purposes. Raman scattering spectroscopy, energy-dispersive X-ray spectrometry (EDS), and X-ray photoelectron spectroscopy (XPS) were used to study the structure and chemical composition of the films. A four-point bending test was applied to study piezoresistive properties of the films. For some samples containing less than 4 at. % Ni and for the samples containing no Ni (as defined by both EDS and XPS), a giant negative piezoresistive effect was observed. The giant negative piezoresistive effect in DLC films deposited by either reactive HIPIMS or dc magnetron sputtering of Ni target was explained by possible clustering of the sp-bonded carbon and/or formation of areas with the decreased hydrogen content. It was suggested that the tensile stress-induced rearrangements of these conglomerations have resulted in the increased conductivity paths.
氢化类金刚石碳(DLC)和 DLC 基镍纳米复合材料(DLC:Ni)薄膜的压阻特性在低浓度镍纳米颗粒范围内进行了研究。这些薄膜是通过反应性高功率脉冲磁控溅射(HIPIMS)Ni 靶沉积的,有些样品是通过直流(dc)反应磁控溅射沉积的,以便进行比较。拉曼散射光谱、能谱(EDS)和 X 射线光电子能谱(XPS)用于研究薄膜的结构和化学成分。四点弯曲测试用于研究薄膜的压阻特性。对于一些含有低于 4 原子%Ni 的样品和不含 Ni 的样品(EDS 和 XPS 均定义),观察到了巨大的负压阻效应。通过反应性 HIPIMS 或 Ni 靶直流磁控溅射沉积的 DLC 薄膜中存在巨大的负压阻效应,这可以通过 sp 键合碳的可能聚集和/或形成氢含量降低的区域来解释。有人认为,这些聚集体的拉伸应力诱导重排导致了导电性路径的增加。