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用于纳米晶金刚石沉积的溅射钨基三元和四元层。

Sputtered tungsten-based ternary and quaternary layers for nanocrystalline diamond deposition.

作者信息

Walock Michael J, Rahil Issam, Zou Yujiao, Imhoff Luc, Catledge Shane A, Nouveau Corinne, Stanishevsky Andrei V

机构信息

Dept. of Physics, University of Alabama at Birmingham, Birmingham, AL 35294, USA.

出版信息

J Nanosci Nanotechnol. 2012 Jun;12(6):4825-31. doi: 10.1166/jnn.2012.4935.

DOI:10.1166/jnn.2012.4935
PMID:22905536
Abstract

Many of today's demanding applications require thin-film coatings with high hardness, toughness, and thermal stability. In many cases, coating thickness in the range 2-20 microm and low surface roughness are required. Diamond films meet many of the stated requirements, but their crystalline nature leads to a high surface roughness. Nanocrystalline diamond offers a smoother surface, but significant surface modification of the substrate is necessary for successful nanocrystalline diamond deposition and adhesion. A hybrid hard and tough material may be required for either the desired applications, or as a basis for nanocrystalline diamond film growth. One possibility is a composite system based on carbides or nitrides. Many binary carbides and nitrides offer one or more mentioned properties. By combining these binary compounds in a ternary or quaternary nanocrystalline system, we can tailor the material for a desired combination of properties. Here, we describe the results on the structural and mechanical properties of the coating systems composed of tungsten-chromium-carbide and/or nitride. These WC-Cr-(N) coatings are deposited using magnetron sputtering. The growth of adherent nanocrystalline diamond films by microwave plasma chemical vapor deposition has been demonstrated on these coatings. The WC-Cr-(N) and WC-Cr-(N)-NCD coatings are characterized with atomic force microscopy and SEM, X-ray diffraction, X-ray photoelectron spectroscopy, Raman spectroscopy, and nanoindentation.

摘要

当今许多高要求的应用需要具有高硬度、韧性和热稳定性的薄膜涂层。在许多情况下,需要涂层厚度在2至20微米范围内且表面粗糙度低。金刚石薄膜满足许多所述要求,但其晶体性质导致表面粗糙度高。纳米晶金刚石提供了更光滑的表面,但为了成功沉积和附着纳米晶金刚石,对衬底进行显著的表面改性是必要的。对于所需应用或作为纳米晶金刚石薄膜生长的基础,可能需要一种兼具硬度和韧性的混合材料。一种可能性是基于碳化物或氮化物的复合体系。许多二元碳化物和氮化物具有上述一种或多种性能。通过在三元或四元纳米晶体系中结合这些二元化合物,我们可以针对所需的性能组合定制材料。在此,我们描述了由碳化钨 - 铬 - 碳化物和/或氮化物组成的涂层体系的结构和力学性能结果。这些WC - Cr - (N)涂层通过磁控溅射沉积。已证明在这些涂层上通过微波等离子体化学气相沉积生长出附着的纳米晶金刚石薄膜。WC - Cr - (N)和WC - Cr - (N) - NCD涂层通过原子力显微镜、扫描电子显微镜、X射线衍射、X射线光电子能谱、拉曼光谱和纳米压痕进行表征。

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