Department of Mechanical Engineering, Yonsei University, Seoul, 120-749, Korea.
Nanoscale Res Lett. 2011 Jul 23;6(1):467. doi: 10.1186/1556-276X-6-467.
In this work, we report highly uniform growth of template-assisted electrodeposited copper nanowires on a large area by lowering the deposition temperature down to subzero centigrade. Even with highly disordered commercial porous anodic aluminum oxide template and conventional potentiostatic electrodeposition, length uniformity over 95% can be achieved when the deposition temperature is lowered down to -2.4°C. Decreased diffusion coefficient and ion concentration gradient due to the lowered deposition temperature effectively reduces ion diffusion rate, thereby favors uniform nanowire growth. Moreover, by varying the deposition temperature, we show that also the pore nucleation and the crystallinity can be controlled.
在这项工作中,我们通过将沉积温度降低到零下摄氏度,实现了在大面积上高度均匀的模板辅助电沉积铜纳米线的生长。即使使用高度无序的商业多孔阳极氧化铝模板和传统的恒电位电沉积,当沉积温度降低到-2.4°C 时,仍可以实现超过 95%的长度均匀性。由于沉积温度的降低导致扩散系数和离子浓度梯度的降低,有效地降低了离子扩散速率,从而有利于均匀的纳米线生长。此外,通过改变沉积温度,我们还表明可以控制孔的成核和结晶度。