Department of Physics, Xiamen University, Xiamen 361005, China.
Opt Lett. 2011 Aug 1;36(15):2946-8. doi: 10.1364/OL.36.002946.
To achieve low loss and complete confinement of light, we propose and study a plasmonic hybrid optical waveguide fabricated on an silicon-on-insulator substrate. Using controlled oxidation and etching processes, a deep submicrometer Si core is fabricated based on UV photolithography patterning. The as-fabricated waveguide demonstrates a very low propagation loss of 1.6 dB/mm at 1550 nm. The numerical study discloses the hybrid characteristics of the mode. It is shown that the optical power of the waveguiding mode distributes more in the high-index Si-core region, and the metal cover further confines the light beyond the diffraction limit. The hybrid waveguide may be applied in compact, high-density Si photonic integrated circuits.
为了实现低损耗和完全限制光，我们提出并研究了一种在绝缘体上硅（SOI）衬底上制造的等离子混合光学波导。使用受控氧化和刻蚀工艺，基于紫外光刻图案化，制造了深亚微米 Si 芯。所制造的波导在 1550nm 时表现出非常低的传播损耗，仅为 1.6dB/mm。数值研究揭示了模式的混合特性。结果表明，导波模式的光功率更多地分布在高折射率 Si 芯区域中，金属覆盖层进一步将光限制在衍射极限之外。这种混合波导可应用于紧凑、高密度的硅光子集成电路中。
