Zgirski M, Riikonen K-P, Tuboltsev V, Jalkanen P, Hongisto T T, Arutyunov K Yu
NanoScience Center, Department of Physics, University of Jyväskylä, PB 35, FI-40014 Jyväskylä, Finland.
Nanotechnology. 2008 Feb 6;19(5):055301. doi: 10.1088/0957-4484/19/05/055301. Epub 2008 Jan 14.
We report a new approach for progressive and well-controlled downsizing of nanostructures below the 10 nm scale. A low energetic ion beam (Ar(+)) is used for gentle surface erosion, progressively shrinking the dimensions with ∼1 nm accuracy. The method enables shaping of the nanostructure geometry and polishing of the surface. The process is clean room/high vacuum compatible being suitable for various applications. Apart from technological advantages, the method enables the study of various size phenomena on the same sample between sessions of ion beam treatment.
我们报告了一种用于将纳米结构逐步且可控地缩小至10纳米以下尺度的新方法。使用低能离子束（Ar(+)）进行温和的表面蚀刻，以约1纳米的精度逐步缩小尺寸。该方法能够塑造纳米结构的几何形状并对表面进行抛光。该工艺与洁净室/高真空兼容，适用于各种应用。除了技术优势外，该方法还能在离子束处理的不同阶段之间，对同一样品上的各种尺寸现象进行研究。
