Miura Atsushi, Tsukamoto Rikako, Yoshii Shigeo, Yamashita Ichiro, Uraoka Yukiharu, Fuyuki Takashi
Graduate School of Materials Science, Nara Institute of Science and Technology, 8916-5 Takayama, Ikoma, Nara 630-0192, Japan.
Nanotechnology. 2008 Jun 25;19(25):255201. doi: 10.1088/0957-4484/19/25/255201. Epub 2008 May 14.
We demonstrated non-volatile flash memory fabrication by utilizing uniformly sized cobalt oxide (Co(3)O(4)) bionanodot (Co-BND) architecture assembled by a cage-shaped supramolecular protein template. A fabricated high-density Co-BND array was buried in a metal-oxide-semiconductor field-effect-transistor (MOSFET) structure to use as the charge storage node of a floating nanodot gate memory. We observed a clockwise hysteresis in the drain current-gate voltage characteristics of fabricated BND-embedded MOSFETs. Observed hysteresis obviously indicates a memory operation of Co-BND-embedded MOSFETs due to the charge confinement in the embedded BND and successful functioning of embedded BNDs as the charge storage nodes of the non-volatile flash memory. Fabricated Co-BND-embedded MOSFETs showed good memory properties such as wide memory windows, long charge retention and high tolerance to repeated write/erase operations. A new pathway for device fabrication by utilizing the versatile functionality of biomolecules is presented.
我们展示了通过利用由笼状超分子蛋白质模板组装的尺寸均匀的氧化钴(Co(3)O(4))生物纳米点(Co-BND)结构来制造非易失性闪存。将制造的高密度Co-BND阵列埋入金属氧化物半导体场效应晶体管(MOSFET)结构中,用作浮动纳米点栅极存储器的电荷存储节点。我们在制造的嵌入BND的MOSFET的漏极电流-栅极电压特性中观察到顺时针滞后现象。观察到的滞后现象明显表明嵌入BND的MOSFET具有存储操作,这是由于嵌入的BND中的电荷限制以及嵌入的BND作为非易失性闪存的电荷存储节点的成功运作。制造的嵌入Co-BND的MOSFET表现出良好的存储特性,如宽存储窗口、长电荷保持时间和对重复写入/擦除操作的高耐受性。提出了一种利用生物分子多功能性进行器件制造的新途径。