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原子力显微镜纳米光刻技术:蘸笔纳米光刻、纳米刮削、纳米接枝、轻敲模式、电化学纳米光刻和热纳米光刻。

Atomic force microscope nanolithography: dip-pen, nanoshaving, nanografting, tapping mode, electrochemical and thermal nanolithography.

作者信息

Rosa Luis G, Liang Jian

机构信息

Department of Physics and Electronics, University of Puerto Rico-Humacao, 100 Road 908 CUH Station, Humacao, PR 00791, USA. The Institute for Functional Nanomaterials, University of Puerto Rico, Facundo Bueso Building, Rio Piedras, PR 00931, USA.

出版信息

J Phys Condens Matter. 2009 Dec 2;21(48):483001. doi: 10.1088/0953-8984/21/48/483001. Epub 2009 Nov 6.

Abstract

Atomic force microscopy (AFM) has been widely employed as a nanoscopic lithography technique. In this review, we summarize the current state of research in this field. We introduce the various forms of the technique, such as nanoshaving, nanografting and dip-pen nanolithography, which we classify according to the different interactions between the AFM probe and the substrate during the nanolithography fabrication process. Mechanical force, applied by the tip to the substrate, is the variable that can be controlled with good precision in AFM and it has been utilized in patterning self-assembled monolayers. In such applications, the AFM tip can break some relatively weak chemical bonds inside the monolayer. In general, the state of the art for AFM nanolithography demonstrates the power, resolution and versatility of the technique.

摘要

原子力显微镜(AFM)已被广泛用作一种纳米光刻技术。在本综述中,我们总结了该领域的当前研究状况。我们介绍了该技术的各种形式,如纳米刮削、纳米接枝和蘸笔纳米光刻,我们根据纳米光刻制造过程中AFM探针与基底之间的不同相互作用对其进行分类。由针尖施加到基底上的机械力是AFM中可以精确控制的变量,并且已被用于对自组装单分子层进行图案化。在这类应用中,AFM针尖可以破坏单分子层内一些相对较弱的化学键。一般来说,AFM纳米光刻的现有技术展示了该技术的强大功能、分辨率和通用性。

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