Department of Electrical Engineering and Computer Sciences, University of California, Berkeley, California 94720, USA.
Phys Rev Lett. 2011 Jul 22;107(4):045002. doi: 10.1103/PhysRevLett.107.045002. Epub 2011 Jul 18.
The velocities of Ar+ and Xe+ ions near the presheath-sheath boundary in an Ar/Xe discharge are studied by particle-in-cell Monte Carlo simulation. For a pure argon discharge the argon ion has almost the same velocity profile as it does in the mixture of argon and xenon. Similarly, for a xenon discharge the xenon ion has almost the same velocity profile as it does in the mixture of argon and xenon. The ion speed at the sheath-presheath boundary is the same for an ion in a pure argon or xenon discharge and for the same ion in a mixture of argon and xenon. We conclude that, in our simulation, each ion reaches its own Bohm speed at the presheath-sheath interface.
通过粒子模拟和蒙特卡罗模拟研究了 Ar/Xe 放电中预鞘层-鞘层边界附近的 Ar+和 Xe+离子速度。对于纯氩放电，氩离子的速度分布与氩-氙混合物中的速度分布几乎相同。同样，对于纯氙放电，氙离子的速度分布也与氩-氙混合物中的速度分布几乎相同。在纯氩或氙放电中，以及在氩-氙混合物中，离子在鞘层-预鞘层边界处的速度相同。我们的结论是，在我们的模拟中，每个离子在预鞘层-鞘层界面处达到自己的玻姆速度。
