Pellicori Samuel F, Martinez Carol L
Pellicori Optical Consulting, Santa Barbara, California 93160, USA.
Appl Opt. 2011 Oct 1;50(28):5559-66. doi: 10.1364/AO.50.005559.
UV optical properties of thin film layers of compound and mixed oxide materials deposited by different processes are presented. Japan Electron Optics Laboratory plasma ion assisted deposition (JEOL PIAD), electron beam with and without IAD, and pulsed DC magnetron sputtering were used. Comparisons are made with published deposition process data. Refractive indices and absorption values to as short as 145 nm were measured by spectroscopic ellipsometry (SE). Electronic interband defect states are detected that are deposition-process dependent. SE might be effective in identifying UV optical film quality, especially in defining processes and material composition beneficial for high-energy excimer laser applications and environments requiring stable optical properties.
介绍了通过不同工艺沉积的化合物和混合氧化物材料薄膜层的紫外光学特性。使用了日本电子光学实验室的等离子体离子辅助沉积（JEOL PIAD）、有无离子辅助沉积的电子束以及脉冲直流磁控溅射。与已发表的沉积工艺数据进行了比较。通过光谱椭偏仪（SE）测量了低至145nm的折射率和吸收值。检测到与沉积工艺相关的电子带间缺陷态。SE可能在识别紫外光学薄膜质量方面有效，特别是在确定有利于高能准分子激光应用和需要稳定光学特性的环境的工艺和材料组成方面。
