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具有可单独寻址顶栅结构的卟啉-硅杂化场效应晶体管。

Porphyrin-silicon hybrid field-effect transistor with individually addressable top-gate structure.

机构信息

Department of Electrical Engineering, KAIST, 291 Daehak-ro, Republic of Korea.

出版信息

ACS Nano. 2012 Jan 24;6(1):183-9. doi: 10.1021/nn204535p. Epub 2011 Dec 15.

Abstract

A conductance-controllable hybrid device that utilizes the photoinduced charge transfer behavior of a porphyrin in a field-effect transistor (FET) with a nanogap is proposed and analyzed. A conventional metal-oxide-semiconductor (MOS) structure is modified to form a nanogap in which the porphyrin can be embedded. The conductance of an inversion channel is controlled by the negatively charged, optically activated porphyrin molecules. The proposed nanogap-formed MOSFET structure solves the conventional dilemma that a top-gate cannot be used for an organic-inorganic hybrid device because the top-gate blocks an entire area of a channel where organic material should be immobilized. The top-gate structure has much practicality compared with the back-gate structure because each device can be controlled individually. Furthermore, the device is highly compatible with the chip-based integrated system because the fabrication process follows the standard complementary metal-oxide-semiconductor (CMOS) technology. The charge transfer mechanisms between silicon and porphyrin are analyzed using devices with different doping polarities and geometrical parameters. The results show that the influence of the negative charge of the porphyrin in the device is reversed when opposite doping polarities are used. The device characteristics can be comprehensively evaluated using the energy band diagram analysis and simulation. The possible application of the proposed device for nonvolatile memory is demonstrated using the optical charging and electrical discharging behavior of the porphyrins.

摘要

提出并分析了一种利用场效应晶体管(FET)中卟啉的光致电荷转移行为的电导可控混合器件,该器件具有纳米间隙。传统的金属-氧化物-半导体(MOS)结构被修改为形成纳米间隙,其中可以嵌入卟啉。反型沟道的电导由带负电荷的、光激活的卟啉分子控制。所提出的形成纳米间隙的 MOSFET 结构解决了传统的困境,即由于顶栅阻止了有机材料应该固定的整个沟道区域,因此不能使用顶栅用于有机-无机混合器件。与背栅结构相比,顶栅结构具有更大的实用性,因为每个器件都可以单独控制。此外,由于制造工艺遵循标准互补金属氧化物半导体(CMOS)技术,因此该器件与基于芯片的集成系统高度兼容。使用具有不同掺杂极性和几何参数的器件分析了硅和卟啉之间的电荷转移机制。结果表明,当使用相反的掺杂极性时,器件中卟啉的负电荷的影响会反转。可以使用能带图分析和模拟对器件特性进行全面评估。通过卟啉的光充电和电放电行为,展示了所提出的器件在非易失性存储器中的可能应用。

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