Chang G S, Kurmaev E Z, Finkelstein L D, Choi H K, Lee W O, Park Y D, Pedersen T M, Moewes A
Department of Physics and Engineering Physics, University of Saskatchewan, 116 Science Place, Saskatoon, SK, S7N 5E2, Canada.
J Phys Condens Matter. 2007 Feb 21;19(7):076215. doi: 10.1088/0953-8984/19/7/076215. Epub 2007 Feb 2.
The electronic structure of as-grown and post-annealed Ga(₁-x)Mn(x)As epilayers (x≈0.055) has been investigated using resonant inelastic x-ray scattering. Mn L₂,₃ x-ray emission spectra show that the integral intensity ratio of Mn L₂ to L₃ emission lines increases with annealing temperature and comes close to that of manganese oxide. The oxygen K-emission/absorption spectra of post-annealed Ga₀.₉₄₅Mn₀.₀₅₅As show 1.5-3.0 times higher degree of oxidation on the film surface than that of the as-grown sample. These experimental findings are attributed to the diffusion of Mn impurity atoms from interstitial positions in the GaAs host lattice to the surface where they are passivated by oxygen.
利用共振非弹性X射线散射研究了生长态和退火后的Ga(₁-x)Mn(x)As外延层(x≈0.055)的电子结构。Mn L₂,₃ X射线发射光谱表明,Mn L₂与L₃发射线的积分强度比随退火温度升高而增加,且接近氧化锰的该比值。退火后的Ga₀.₉₄₅Mn₀.₀₅₅As的氧K发射/吸收光谱显示,薄膜表面的氧化程度比生长态样品高1.5至3.0倍。这些实验结果归因于Mn杂质原子从GaAs主晶格中的间隙位置扩散到表面,在表面它们被氧钝化。