Yadav Ksenia, Callender C L, Smelser C W, Ledderhof C, Blanchetiere C, Jacob S, Albert J
Department of Electronics, Carleton University, Ottawa, ON, Canada.
Opt Express. 2011 Dec 19;19(27):26975-83. doi: 10.1364/OE.19.026975.
Multilayered thin-film doped silica structures are experimentally demonstrated as an effective tool to enhance the second-order nonlinear properties induced in thermally poled glass devices. A 204-fold improvement is obtained in the second harmonic generated (SHG) in a poled structure with a 3 μm-thick multilayered stack consisting of sub- 100 nm-thick alternating germanium-doped and undoped silica layers compared to poled bulk silica glass. The induced nonlinearity is localized within the layered region, indicating that the multilayered design can be used to precisely control the thickness and the location of the nonlinearity. Such artificial nonlinear structures can be used to overcome the main limitations of existing poled glass devices, therefore opening the door to practical implementations of efficient active devices in silica glass.
多层薄膜掺杂二氧化硅结构通过实验证明是一种有效的工具，可增强热极化玻璃器件中诱导的二阶非线性特性。与极化块状二氧化硅玻璃相比，在具有由厚度小于100nm的交替锗掺杂和未掺杂二氧化硅层组成的3μm厚多层堆叠的极化结构中，二次谐波产生（SHG）提高了204倍。诱导的非线性局限于分层区域内，这表明多层设计可用于精确控制非线性的厚度和位置。这种人工非线性结构可用于克服现有极化玻璃器件的主要限制，从而为二氧化硅玻璃中高效有源器件的实际应用打开大门。
