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在零偏压和极低偏压下通过小振幅 NC-AFM 对 Si(100) 表面进行成像和操控。

Imaging and manipulation of the Si(100) surface by small-amplitude NC-AFM at zero and very low applied bias.

机构信息

School of Physics and Astronomy, University of Nottingham, Nottingham, UK.

出版信息

J Phys Condens Matter. 2012 Feb 29;24(8):084009. doi: 10.1088/0953-8984/24/8/084009. Epub 2012 Feb 7.

Abstract

We use a noncontact atomic force microscope in the qPlus configuration to investigate the structure and influence of defects on the Si(100) surface. By applying millivolt biases, simultaneous tunnel current data is acquired, providing information about the electronic properties of the surface at biases often inaccessible during conventional STM imaging, and highlighting the difference between the contrast observed in NC-AFM and tunnel current images. We also show how NC-AFM (in the absence of tunnel current) can be used to manipulate both the clean c(4 × 2) surface and dopant-related defects.

摘要

我们使用 qPlus 配置的非接触原子力显微镜来研究 Si(100)表面的结构和缺陷的影响。通过施加毫伏偏压,同时获取隧道电流数据,提供了在传统 STM 成像中通常无法获得的偏压下表面电子特性的信息,并突出了 NC-AFM 和隧道电流图像中观察到的对比度之间的差异。我们还展示了如何在没有隧道电流的情况下使用 NC-AFM 来操纵清洁的 c(4×2)表面和掺杂相关的缺陷。

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