Kiriyama Ryutaro, Takenaka Tomoya, Kurisu Yousuke, Nozaki Dai, Sato Fuminobu, Kato Yushi, Iida Toshiyuki
Division of Electrical, Electronic and Information Engineering, Graduate School of Engineering, Osaka University, 2-1 Yamada-oka, Suita-shi, Osaka 565-0871, Japan.
Rev Sci Instrum. 2012 Feb;83(2):02A324. doi: 10.1063/1.3669792.
We measure the ion beam current and the plasma parameters by using the pulse mode microwave operation in the first stage of a tandem type ECRIS. The time averaged extracted ion beam current in the pulse mode operation is larger than that of the cw mode operation with the same averaged microwave power. The electron density n(e) in the pulse mode is higher and the electron temperature T(e) is lower than those of the cw mode operation. These plasma parameters are considered to cause in the increase of the ion beam current and are suitable to produce molecular or cluster ions.
我们在串联式电子回旋共振离子源(ECRIS)的第一阶段使用脉冲模式微波运行来测量离子束电流和等离子体参数。在脉冲模式运行中,时间平均提取离子束电流大于具有相同平均微波功率的连续波(cw)模式运行时的电流。脉冲模式下的电子密度n(e)较高,且电子温度T(e)低于连续波模式运行时的电子密度和温度。这些等离子体参数被认为是导致离子束电流增加的原因,并且适合于产生分子或团簇离子。