Chen L, Zhang G L, Jin D Z, Yang L, Dai J Y
Institute of Electronic Engineering, China Academy of Engineering Physics, Mianyang, Sichuan 621900, China.
Rev Sci Instrum. 2012 Feb;83(2):02A509. doi: 10.1063/1.3673008.
The influence of the discharge gap between cathode and anode on the discharge stability in a short vacuum arc (SVA) ion source is presented in this paper. Planar cathode and cylindrical hollow anode made of titanium are investigated. There is a great need in present accelerator injection research for SVA source to produce the small deviation of the ion current beam. Current research shows that increasing the short discharge gap can reduce the level of ion current deviation and ion charge deviation from 29% and 31% to 15% and 17%, respectively. A microplasma plume generation mechanism in SVA and scanning electron microscopic results can be used to explain this interesting phenomenon.
本文介绍了阴极与阳极之间的放电间隙对短真空电弧（SVA）离子源放电稳定性的影响。研究了由钛制成的平面阴极和圆柱形空心阳极。当前加速器注入研究中非常需要SVA源来产生离子电流束的小偏差。当前研究表明，增加短放电间隙可将离子电流偏差和离子电荷偏差水平分别从29%和31%降低至15%和17%。SVA中的微等离子体羽流产生机制和扫描电子显微镜结果可用于解释这一有趣现象。
