Department of Mechanical and Aerospace Engineering, Princeton Institute for Science and Technology of Materials, Princeton University, Princeton, NJ 08544, USA.
Nanotechnology. 2012 Apr 27;23(16):165304. doi: 10.1088/0957-4484/23/16/165304. Epub 2012 Apr 2.
There exist many optical lithography techniques for generating nanostructures on hard, flat surfaces over large areas. However, few techniques are able to create such patterns on soft materials or surfaces with pre-existing structure. To address this need, we demonstrate the use of parallel optical trap assisted nanopatterning (OTAN) to provide an efficient and robust direct-write method of producing nanoscale features without the need for focal plane adjustment. Parallel patterning on model surfaces of polyimide with vertical steps greater than 1.5 µm shows a feature size uncertainty better than 4% across the step and lateral positional accuracy of 25 nm. A Brownian motion model is used to describe the positional accuracy enabling one to predict how variation in system parameters will affect the nanopatterning results. These combined results suggest that OTAN is a viable technique for massively parallel direct-write nanolithography on non-traditional surfaces.
存在许多用于在硬平面上大面积生成纳米结构的光学光刻技术。然而，很少有技术能够在软材料或具有预先存在结构的表面上创建此类图案。为了解决这一需求，我们展示了使用平行光阱辅助纳米图案化（OTAN）来提供一种高效、强大的直接写入方法，无需进行焦平面调整即可生成纳米级特征。在聚酰亚胺的模型表面上进行平行图案化，该表面的垂直台阶大于 1.5 µm，在整个台阶上的特征尺寸不确定性优于 4%，横向位置精度为 25 nm。使用布朗运动模型来描述位置精度，从而可以预测系统参数的变化如何影响纳米图案化结果。这些综合结果表明，OTAN 是在非传统表面上进行大规模并行直接写入纳米光刻的可行技术。
