McLeod Euan, Arnold Craig B
Nat Nanotechnol. 2008 Jul;3(7):413-7. doi: 10.1038/nnano.2008.150. Epub 2008 Jun 8.
A number of non-lithographic techniques are now available for processing materials on the nanoscale, including optical techniques capable of producing features that are much smaller than the wavelength of light used. However, these techniques can be limited in speed, ease of use, cost of implementation, or the range of patterns they can write. Here we report how Bessel beam laser trapping of microspheres near surfaces can be used to enable near-field direct-write subwavelength nanopatterning. Using the microsphere as an objective lens to focus the processing laser, we demonstrate arbitrary patterns and individual features with minimum sizes of approximately 100 nm (which is less than one-third the processing wavelength) and a positioning accuracy better than 40 nm in aqueous and chemical environments. Submicron spacing is maintained between the near-field objective and the substrate without active feedback control. If implemented with an array of optical traps, this approach could lead to a high-throughput probe-based method for patterning surfaces with subwavelength features.
现在有许多非光刻技术可用于在纳米尺度上处理材料，包括能够产生比所用光波长小得多的特征的光学技术。然而，这些技术在速度、易用性、实施成本或可写入图案的范围方面可能受到限制。在此我们报告如何利用表面附近微球的贝塞尔光束激光捕获来实现近场直接写入亚波长纳米图案化。通过使用微球作为物镜来聚焦加工激光，我们在水性和化学环境中展示了最小尺寸约为100 nm（小于加工波长的三分之一）的任意图案和单个特征，以及优于40 nm的定位精度。在没有主动反馈控制的情况下，近场物镜与基板之间保持亚微米间距。如果用一系列光阱来实施，这种方法可能会导致一种基于探针的高通量方法，用于对具有亚波长特征的表面进行图案化。
