Department of Chemical and Biological Engineering, University of Wisconsin-Madison, Madison, Wisconsin 53706, USA.
Langmuir. 2012 May 8;28(18):7299-307. doi: 10.1021/la300552w. Epub 2012 Apr 24.
Chemical patterns consisting of poly(2-vinyl pyridine) (P2VP) brushes in a background of a cross-linked polystyrene (PS) mat enabled the highly selective placement of citrate-stabilized Au nanoparticles (NPs) in arrays on surfaces. The cross-linked PS mat prevented the nonspecific binding of Au NPs, and the regions functionalized with P2VP brushes allowed the immobilization of the particles. Isolated chemical patterns of feature sizes from hundreds to tens of nanometers were prepared by standard lithographic techniques. The number of 13 nm Au NPs bound per feature increased linearly with increasing area of the patterns. This behavior is similar to previous reports using 40 nm particles or larger. Arrays of single NPs were obtained by reducing the dimensions of patterned P2VP brushes to below ~20 nm. To generate dense (center-to-center distance = 80 nm) linear chemical patterns for the placement of rows of single NPs, a block-copolymer (BCP)-assisted lithographic process was used. BCPs healed defects associated with the standard lithographic patterning of small dimensions at high densities and led to highly registered, linear, single NP arrays.
化学图案由交联聚苯乙烯(PS)基质中的聚(2-乙烯基吡啶)(P2VP)刷组成,可在表面上将柠檬酸稳定的金纳米粒子(NPs)高度选择性地排列成阵列。交联 PS 基质可防止 Au NPs 的非特异性结合,而功能化的 P2VP 刷区域可固定颗粒。通过标准光刻技术制备了特征尺寸从数百到数十纳米的孤立化学图案。每个特征结合的 13nm Au NPs 的数量随图案面积的增加呈线性增加。这种行为类似于以前使用 40nm 颗粒或更大颗粒的报告。通过将图案化 P2VP 刷的尺寸减小到低于~20nm,可获得单 NPs 的阵列。为了生成用于放置单行单 NPs 的密集(中心到中心距离=80nm)线性化学图案,使用了嵌段共聚物(BCP)辅助的光刻工艺。BCP 可修复与小尺寸高密度标准光刻图案相关的缺陷,并导致高度注册的线性单 NP 阵列。