Wei Mingjie, Wang Yong
State Key Laboratory of Materials-Oriented Chemical Engineering and College of Chemical Engineering, Nanjing Tech University, Nanjing 210009, Jiangsu, China.
Materials (Basel). 2015 Jun 24;8(7):3793-3805. doi: 10.3390/ma8073793.
Patterning metallic nanoparticles on substrate surfaces is important in a number of applications. However, it remains challenging to fabricate such patterned nanoparticles with easily controlled structural parameters, including particle sizes and densities, from simple methods. We report on a new route to directly pattern pre-formed gold nanoparticles with different diameters on block copolymer micellar monolayers coated on silicon substrates. Due to the synergetic effect of complexation and electrostatic interactions between the micellar cores and the gold particles, incubating the copolymer-coated silicon in a gold nanoparticles suspension leads to a monolayer of gold particles attached on the coated silicon. The intermediate micellar film was then removed using oxygen plasma treatment, allowing the direct contact of the gold particles with the Si substrate. We further demonstrate that the gold nanoparticles can serve as catalysts for the localized etching of the silicon substrate, resulting in nanoporous Si with a top layer of straight pores.
在许多应用中，在基底表面上制备图案化的金属纳米颗粒非常重要。然而，通过简单方法制造具有易于控制的结构参数（包括粒径和密度）的这种图案化纳米颗粒仍然具有挑战性。我们报道了一种新方法，可将不同直径的预先形成的金纳米颗粒直接图案化在涂覆于硅基底上的嵌段共聚物胶束单层上。由于胶束核与金颗粒之间络合和静电相互作用的协同效应，将涂覆有共聚物的硅置于金纳米颗粒悬浮液中进行孵育，会导致单层金颗粒附着在涂覆的硅上。然后使用氧等离子体处理去除中间的胶束膜，使金颗粒与硅基底直接接触。我们进一步证明，金纳米颗粒可作为硅基底局部蚀刻的催化剂，从而得到具有直孔顶层的纳米多孔硅。
