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代尔夫特范列文虎克实验室的氦离子显微镜成像与纳米制造。

Imaging and nanofabrication with the helium ion microscope of the Van Leeuwenhoek Laboratory in Delft.

作者信息

Alkemade Paul F A, Koster Emma M, van Veldhoven Emile, Maas Diederik J

机构信息

Kavli Institute of Nanoscience, Delft University of Technology, Delft, The Netherlands.

出版信息

Scanning. 2012 Mar-Apr;34(2):90-100. doi: 10.1002/sca.21009.

DOI:10.1002/sca.21009
PMID:22544486
Abstract

Although helium ion microscopy (HIM) was introduced only a few years ago, many new application fields are emerging. The connecting factor between these novel applications is the unique interaction of the primary helium ion beam with the sample material at and just below its surface. In particular, the HIM secondary electron signal stems from an area that is extremely well localized around the point of incidence of the primary beam. This makes the HIM well suited for both high-resolution imaging and high-resolution nanofabrication. Another advantage in nanofabrication is the low ion backscattering fraction, which leads to a weak proximity effect. The subnanometer probe size and the unique beam-materials interactions have opened new areas of research. This review presents a selection of studies conducted on a single instrument. The selection encompasses applications ranging from imaging to nanofabrication and from fundamental academic research to applied industrial developments.

摘要

尽管氦离子显微镜(HIM)几年前才被引入,但许多新的应用领域正在涌现。这些新应用之间的联系因素是初级氦离子束与样品材料在其表面及紧邻表面下方的独特相互作用。特别是,HIM二次电子信号源自一个在初级束入射点周围定位极其精确的区域。这使得HIM非常适合高分辨率成像和高分辨率纳米加工。纳米加工的另一个优势是低离子背散射率,这导致较弱的邻近效应。亚纳米级的探针尺寸和独特的束-材料相互作用开辟了新的研究领域。本综述介绍了在一台仪器上进行的一系列研究。所选内容涵盖了从成像到纳米加工以及从基础学术研究到应用工业发展等各种应用。

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A review of defect engineering, ion implantation, and nanofabrication using the helium ion microscope.利用氦离子显微镜对缺陷工程、离子注入和纳米加工的综述。
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Scanning reflection ion microscopy in a helium ion microscope.
氦离子显微镜中的扫描反射离子显微镜
Beilstein J Nanotechnol. 2015 May 7;6:1125-37. doi: 10.3762/bjnano.6.114. eCollection 2015.