School of Chemistry, University of Manchester, Oxford Road, Manchester M139PL, UK.
J Mol Model. 2012 Oct;18(10):4625-38. doi: 10.1007/s00894-012-1454-8. Epub 2012 May 30.
The nature and strength of halogen bonding in halo molecule-Lewis base complexes were studied in terms of molecular mechanics using our recently developed positive extra-point (PEP) approach, in which the σ-hole on the halogen atom is represented by an extra point of positive charge. The contributions of the σ-hole (i.e., positively charged extra point) and the halogen atom to the strength of this noncovalent interaction were clarified using the atomic parameter contribution to the molecular interaction (APCtMI) approach. The molecular mechanical results revealed that the halogen bond is electrostatic and van der Waals in nature, and its strength depends on three types of interaction: (1) the attractive electrostatic interaction between the σ-hole and the Lewis base, (2) the repulsive electrostatic interaction between the negative halogen atom and the Lewis base, and (3) the repulsive/attractive van der Waals interactions between the halogen atom and the Lewis base. The strength of the halogen bond increases with increasing σ-hole size (i.e., magnitude of the extra-point charge) and increasing halogen atom size. The van der Waals interaction's contribution to the halogen bond strength is most favorable in chloro complexes, whereas the electrostatic interaction is dominant in iodo complexes. The idea that the chloromethane molecule can form a halogen bond with a Lewis base was revisited in terms of quantum mechanics and molecular mechanics. Although chloromethane does produce a positive region along the C-Cl axis, basis set superposition error corrected second-order Møller-Plesset calculations showed that chloromethane-Lewis base complexes are unstable, producing halogen-Lewis base contacts longer than the sum of the van der Waals radii of the halogen and O/N atoms. Molecular mechanics using the APCtMI approach showed that electrostatic interactions between chloromethane and a Lewis base are unfavorable owing to the high negative charge on the chlorine atom, which overcomes the corresponding favorable van der Waals interactions.
采用我们最近开发的正额外点(PEP)方法,从分子力学角度研究了卤代分子-路易斯碱复合物中卤键的性质和强度,其中卤素原子上的 σ 空穴由一个正电荷的额外点表示。采用原子参数对分子相互作用的贡献(APCtMI)方法,阐明了 σ 空穴(即带正电荷的额外点)和卤素原子对这种非共价相互作用强度的贡献。分子力学结果表明,卤键具有静电和范德华性质,其强度取决于三种相互作用:(1)σ 空穴与路易斯碱之间的吸引力静电相互作用,(2)负卤素原子与路易斯碱之间的排斥性静电相互作用,(3)卤素原子与路易斯碱之间的排斥/吸引力范德华相互作用。卤键的强度随 σ 空穴尺寸(即额外点电荷的大小)和卤素原子尺寸的增加而增加。范德华相互作用对卤键强度的贡献在氯代配合物中最为有利,而静电相互作用在碘代配合物中占主导地位。重新审视了甲烷分子与路易斯碱形成卤键的想法,从量子力学和分子力学的角度来看。尽管甲烷分子在 C-Cl 轴上产生了一个正区域,但基组叠加误差校正的二阶 Møller-Plesset 计算表明,甲烷-路易斯碱复合物不稳定,产生的卤键-路易斯碱接触长度超过卤素和 O/N 原子范德华半径之和。采用 APCtMI 方法的分子力学表明,由于氯原子上的高负电荷,甲烷与路易斯碱之间的静电相互作用是不利的,克服了相应的有利范德华相互作用。