Department of Plant Physiology, Slovak University of Agriculture in Nitra, Nitra, Slovakia.
Plant Physiol Biochem. 2012 Aug;57:93-105. doi: 10.1016/j.plaphy.2012.05.012. Epub 2012 May 21.
Photosystem II (PSII) thermostability and acclimation effects on PSII photochemical efficiency were analyzed in thirty field grown winter wheat (Triticum aestivum L.) genotypes using prompt chlorophyll a fluorescence kinetics before and after dark heat treatment. A gradual increase in temperature caused the appearance of K-bands at 300 μs on the chlorophyll fluorescence induction curve, indicating the impairment of the PSII donor side (even by heat treatment at 38 °C). An increase in basal fluorescence, commonly used as a criterion of PSII thermostability, was observed beyond a temperature threshold of 44 °C. Moreover, an acclimation shift (increase of critical temperature) was observed at the 3.5 °C identified for K-band appearance, but only by 1.1 °C for a steep increase in F(0). The single temperature approach with regular weekly observations completed within two months using dark heat treatment at 40 °C demonstrated that the acclimation effect is not gradual, but occurs immediately and is associated with an increase of daily temperature maxima over 30 °C. The acclimated heat treated samples had less effect on the donor side of PSII, the higher fraction of active Q(A)(-) reducing reaction centers and causing a much lower decrease of connectivity among PSII units compared to non-acclimated samples. In the non-treated plants the reduction of antennae size, increase of PSII connectivity and changes in the acceptor side occurred as a result of heat acclimation. The enhancement of PSII thermostability persisted over several weeks regardless of weather conditions. The genotype comparison identified three groups that differed either in initial PSII thermostability or in acclimation capacity; these groupings were clearly associated with the origin of the genotypes.
采用暗适应高温处理前后快速叶绿素荧光动力学技术,分析了 30 个冬小麦品种的光系统 II(PSII)热稳定性及其对 PSII 光化学效率的适应效应。随着温度的升高,叶绿素荧光诱导曲线在 300 μs 处出现 K 带,表明 PSII 供体侧受到损伤(即使在 38°C 的热处理下也是如此)。在超过 44°C 的温度阈值时,观察到基础荧光的增加,通常用作 PSII 热稳定性的标准。此外,在 K 带出现的 3.5°C 处观察到适应变化(临界温度升高),但仅在 F(0)急剧增加时才增加 1.1°C。在两个月内,每周进行一次常规观察,使用 40°C 的暗热处理完成单一温度处理,表明适应效应不是渐进的,而是立即发生的,与每日最高温度超过 30°C的增加有关。与未经处理的样品相比,适应处理的样品对 PSII 的供体侧影响较小,具有更高比例的活性 Q(A)(-)还原反应中心,并且 PSII 单元之间的连接性降低幅度较小。在未经处理的植物中,天线大小的减小、PSII 连接性的增加以及受体侧的变化是热适应的结果。无论天气条件如何,PSII 热稳定性的增强都能持续数周。基因型比较确定了三个组,它们要么在初始 PSII 热稳定性方面存在差异,要么在适应能力方面存在差异;这些分组与基因型的起源明显相关。