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H(+)辐照 ZnO 单晶体的光致发光和正电子湮没光谱研究。

Photoluminescence and positron annihilation spectroscopic investigation on a H(+) irradiated ZnO single crystal.

机构信息

Department of Physics, Bangabasi Morning College, 19 Rajkumar Chakraborty Sarani, Kolkata 700 009, India.

出版信息

J Phys Condens Matter. 2012 Aug 15;24(32):325503, 1-9. doi: 10.1088/0953-8984/24/32/325503. Epub 2012 Jul 12.

DOI:10.1088/0953-8984/24/32/325503
PMID:22790024
Abstract

Low temperature photoluminescence and room temperature positron annihilation spectroscopy have been employed to investigate the defects incorporated by 6 MeV H(+) ions in a hydrothermally grown ZnO single crystal. Prior to irradiation, the emission from donor bound excitons is at 3.378 eV (10 K). The irradiation creates an intense and narrow emission at 3.368 eV (10 K). The intensity of this peak is nearly four times that of the dominant near band edge peak of the pristine crystal. The characteristic features of the 3.368 eV emission indicate its origin as a 'hydrogen at oxygen vacancy' type defect. The positron annihilation lifetime measurement reveals a single component lifetime spectrum for both the unirradiated (164 ± 1 ps) and irradiated crystal (175 ± 1 ps). It reflects the fact that the positron lifetime and intensity of the new irradiation driven defect species are a little higher compared to those in the unirradiated crystal. However, the estimated defect concentration, even considering the high dynamic defect annihilation rate in ZnO, comes out to be ∼4 × 10(17) cm(-3) (using SRIM software). This is a very high defect concentration compared to the defect sensitivity of positron annihilation spectroscopy. A probable reason is the partial filling of the incorporated vacancies (positron traps), which in ZnO are zinc vacancies. The positron lifetime of ∼175 ps (in irradiated ZnO) is consistent with recent theoretical calculations for partially hydrogen-filled zinc vacancies in ZnO. Passivation of oxygen vacancies by hydrogen is also reflected in the photoluminescence results. A possible reason for such vacancy filling (at both Zn and O sites) due to irradiation has also been discussed.

摘要

低温光致发光和室温正电子湮没谱已被用于研究在水热生长的 ZnO 单晶中由 6 MeV H(+)离子掺入的缺陷。辐照前,施主束缚激子的发射位于 3.378 eV(10 K)。辐照产生了一个在 3.368 eV(10 K)处强烈而狭窄的发射。该峰的强度几乎是原始晶体主导近带边峰的四倍。3.368 eV 发射的特征表明其起源为“氢在氧空位”型缺陷。正电子湮没寿命测量表明,未辐照(164 ± 1 ps)和辐照晶体(175 ± 1 ps)的寿命谱均为单组分。这反映了这样一个事实,即新辐照驱动的缺陷物种的正电子寿命和强度比未辐照晶体中的稍高。然而,即使考虑到 ZnO 中高动态缺陷湮没率,估计的缺陷浓度(使用 SRIM 软件)也达到了约 4×10(17) cm(-3)。与正电子湮没光谱的缺陷灵敏度相比,这是一个非常高的缺陷浓度。一个可能的原因是掺入空位(正电子陷阱)的部分填充,在 ZnO 中这些空位是锌空位。辐照 ZnO 中的正电子寿命约为 175 ps,与最近 ZnO 中部分填充氢的锌空位的理论计算一致。氧空位被氢的钝化也反映在光致发光结果中。还讨论了辐照导致这种空位填充(在 Zn 和 O 位)的可能原因。

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