ACS Appl Mater Interfaces. 2012 Aug;4(8):3779-83. doi: 10.1021/am3010972. Epub 2012 Aug 7.
A simple and efficient method for fabricating gold nanoparticle (AuNP) arrays is developed. With this method, the AuNP arrays are fabricated by taking an electrochemical deposition (ECD) process on the ITO substrate, which is initially patterned with nanoimprint lithography (NIL). The stamp for NIL is fabricated by the cost-efficient nanosphere lithography (NSL). The size of the AuNPs can be adjusted by varying the potential and duration of ECD. In this work, the diameters of AuNPs are varied from 130 to 420 nm. The AuNP arrays can be readily extended to other conductive substrates, which may be applied for detecting and sensing.
一种简单高效的金纳米粒子（AuNP）阵列制造方法。该方法通过在初始采用纳米压印光刻（NIL）图案化的 ITO 衬底上进行电化学沉积（ECD）过程来制造 AuNP 阵列。NIL 的模具由具有成本效益的纳米球光刻（NSL）制造。通过改变 ECD 的电位和持续时间，可以调整 AuNP 的尺寸。在这项工作中，AuNP 的直径从 130nm 变化到 420nm。AuNP 阵列可以很容易地扩展到其他导电衬底，可用于检测和传感。
