头静脉切开入路的结果：一种用于完全植入式静脉通路装置置入的安全可行的入路。
Outcome of cephalic vein cut-down approach: A safe and feasible approach for totally implantable venous access device placement.
作者信息
Koketsu Shinichiro, Samesima Shinishi, Yoneyama Satomi, Okada Toshiyuki, Tomozawa Shigeru, Horikoshi Hiroyuki, Sawada Toshio
机构信息
First Department of Surgery, Koshigaya Hospital, Dokkyo Medical University, Saitama.
出版信息
Oncol Lett. 2010 Nov;1(6):1029-1031. doi: 10.3892/ol.2010.189. Epub 2010 Sep 23.
Abstract
This study aimed to evaluate the safety and feasibility of the venous access via the cephalic vein cut-down (CVCD) approach for totally implantable venous access device (TIVAD) placements. A total of 79 patients who received TIVAD for the treatment of unresectable or recurrent colorectal carcinomas were recruited. The operation time and the complications were evaluated. Results showed the TIVAD placement via the CVCD approach was successful in 74 patients. A total of 5 patients required conversion to a percutaneous puncture approach. The mean operation time was 34.7 min. No intraoperative or postoperative complications were observed. Therefore, the CVCD approach is a safe and feasible method for TIVAD placement.
摘要
本研究旨在评估经头静脉切开（CVCD）途径置入全植入式静脉通路装置（TIVAD）的安全性和可行性。共招募了79例因治疗不可切除或复发性结直肠癌而接受TIVAD的患者。评估了手术时间和并发症。结果显示，74例患者通过CVCD途径成功置入TIVAD。共有5例患者需要转为经皮穿刺途径。平均手术时间为34.7分钟。未观察到术中或术后并发症。因此，CVCD途径是一种安全可行的TIVAD置入方法。
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External jugular vein cutdown approach, as a useful alternative, supports the choice of the cephalic vein for totally implantable access device placement.作为一种有用的替代方法，颈外静脉切开入路支持选择头静脉进行完全植入式接入装置的放置。
Ann Surg Oncol. 2005 Jul;12(7):570-3. doi: 10.1245/ASO.2005.04.028. Epub 2005 May 5.
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