Materials Science and Technology Division, Oak Ridge National Laboratory, Oak Ridge, TN 37831, USA.
Adv Mater. 2012 Dec 18;24(48):6423-8. doi: 10.1002/adma.201202691. Epub 2012 Oct 4.
Atomic layer engineering enables fabrication of a chemically sharp oxide heterointerface. The interface formation and strain evolution during the initial growth of LaAlO(3) /SrTiO(3) heterostructures by pulsed laser deposition are investigated in search of a means for controlling the atomic-sharpness of the interface. This study shows that inserting a monolayer of LaAlO(3) grown at high oxygen pressure dramatically enhances interface abruptness.
原子层工程使得化学尖锐氧化物异质界面的制造成为可能。通过脉冲激光沉积研究了 LaAlO(3)/SrTiO(3) 异质结构初始生长过程中的界面形成和应变演化，以寻找控制界面原子尖锐度的方法。本研究表明，在高氧压下生长的单层 LaAlO(3) 的插入极大地增强了界面的突然性。
