Department of Electrical and Computer Engineering, University of Alberta, Edmonton, AB T6G 2V4, Canada. jsiewert@ualberta
Microsc Microanal. 2012 Oct;18(5):1135-42. doi: 10.1017/S1431927612001080.
With growing interest in nanostructured thin films produced by glancing angle deposition (GLAD), it becomes increasingly important to understand their overall growth mechanics and nanocolumn structure. We present a new method of isolating the individual nanocolumns of GLAD films, facilitating automated measurement of their broadening profiles. Data collected for α = 81° TiO2 vertical nanocolumns deposited across a range of substrate rotation rates demonstrates that these rates influence growth scaling parameters. Further, individual posts were found in each case that violate predicted Kardar-Parisi-Zhang growth scaling limits. The technique's current iteration is comparable to existing techniques in speed: though data were studied from 10,756 individual objects, the majority could not be confidently used in subsequent analysis. Further refinement may allow high-throughput automated film characterization and permit close examination of subtle growth trends, potentially enhancing control over GLAD film broadening and morphology.
随着人们对掠角沉积（GLAD）产生的纳米结构薄膜越来越感兴趣，了解其整体生长机理和纳米柱结构变得越来越重要。我们提出了一种新的方法来分离 GLAD 薄膜的各个纳米柱，从而方便自动测量其展宽轮廓。针对 α = 81°TiO2 垂直纳米柱在一系列基底旋转速率下的沉积情况收集的数据表明，这些速率会影响生长比例参数。此外，在每种情况下都发现了个别违反 Kardar-Parisi-Zhang 生长比例限制的立柱。该技术的当前迭代在速度上与现有技术相当：尽管从 10756 个单独的对象中研究了数据，但大多数数据在后续分析中无法被自信地使用。进一步的改进可能允许进行高通量的自动化薄膜特性分析，并允许对微妙的生长趋势进行仔细检查，从而有可能增强对 GLAD 薄膜展宽和形貌的控制。
