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多层结构背散射电子强度的模拟,用于解释二次电子衬度。

Simulation of the backscattered electron intensity of multi layer structure for the explanation of secondary electron contrast.

机构信息

Research Institute for Technical Physics and Materials Science, Budapest H-1525, P.O. Box 49, Hungary.

出版信息

Ultramicroscopy. 2013 Jan;124:88-95. doi: 10.1016/j.ultramic.2012.08.004. Epub 2012 Aug 21.

Abstract

The intensities of the secondary electrons (SE) and of the backscattered electrons (BSE) at energy 100 eV have been measured on a Ni/C/Ni/C/Ni/C/(Si substrate) multilayer structure by exciting it with primary electrons of 5, 2.5 and 1.25 keV energies. It has been found that both intensities similarly vary while thinning the specimen. The difference as small as 4 nm in the underlying layer thicknesses resulted in visible intensity change. Utilizing this intensity change, the thickness difference of neighboring regions could be revealed from the SE image. No simple phenomenological model was found to interpret the change of intensity, thus the intensity of the BSE electrons has been calculated by means of a newly developed Monte Carlo simulation. This code also considers the secondary electron generation and transport through the solid. The calculated and measured intensities agree well supporting the validity of the model.

摘要

已通过用 5、2.5 和 1.25 keV 能量的初级电子激发 Ni/C/Ni/C/Ni/C/(Si 衬底)多层结构,测量了次级电子 (SE) 和背散射电子 (BSE) 在 100 eV 能量下的强度。结果发现,随着样品变薄,两种强度都会发生类似的变化。在底层厚度相差仅 4nm 的情况下,强度就会发生明显变化。利用这种强度变化,可以从 SE 图像中揭示相邻区域的厚度差异。尚未发现简单的唯象模型可以解释强度的变化,因此通过新开发的蒙特卡罗模拟计算了 BSE 电子的强度。该代码还考虑了通过固体的二次电子产生和传输。计算和测量的强度吻合较好,支持了模型的有效性。

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