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控制化学气相沉积石墨烯的取向、边缘几何形状和厚度。

Controlling the orientation, edge geometry, and thickness of chemical vapor deposition graphene.

机构信息

Department of Materials, University of Oxford, Oxford OX1 3PH, United Kingdom.

出版信息

ACS Nano. 2013 Feb 26;7(2):1351-9. doi: 10.1021/nn3049297. Epub 2013 Feb 1.

Abstract

We report that the shape, orientation, edge geometry, and thickness of chemical vapor deposition graphene domains can be controlled by the crystallographic orientations of Cu substrates. Under low-pressure conditions, single-layer graphene domains align with zigzag edges parallel to a single <101> direction on Cu(111) and Cu(101), while bilayer domains align to two directions on Cu(001). Under atmospheric pressure conditions, hexagonal domains also preferentially align. This discovery can be exploited to generate high-quality, tailored graphene with controlled domain thickness, orientations, edge geometries, and grain boundaries.

摘要

我们报告称,通过控制 Cu 衬底的晶体取向,可以控制化学气相沉积石墨烯畴的形状、取向、边缘几何形状和厚度。在低压条件下,单层石墨烯畴与 Cu(111)和 Cu(101)上平行于单一 <101>方向的锯齿边缘对齐,而双层畴则与 Cu(001)上的两个方向对齐。在常压条件下,六方畴也优先对齐。这一发现可用于生成具有可控畴厚度、取向、边缘几何形状和晶界的高质量、定制化石墨烯。

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