Yuan Qinghong, Song Guangyao, Sun Deyan, Ding Feng
1] Department of Physics, East China Normal University, Shanghai, China [2] Key laboratory of Computational Physical Sciences (Fudan University), Ministry of Education, Shanghai, China.
Department of Physics, East China Normal University, Shanghai, China.
Sci Rep. 2014 Oct 7;4:6541. doi: 10.1038/srep06541.
Grain boundaries (GBs) in graphene prepared by chemical vapor deposition (CVD) greatly degrade the electrical and mechanical properties of graphene and thus hinder the applications of graphene in electronic devices. The seamless stitching of graphene flakes can avoid GBs, wherein the identical orientation of graphene domain is required. In this letter, the graphene orientation on one of the most used catalyst surface - Cu(100) surface, is explored by density functional theory (DFT) calculations. Our calculation demonstrates that a zigzag edged hexagonal graphene domain on a Cu(100) surface has two equivalent energetically preferred orientations, which are 30 degree away from each other. Therefore, the fusion of graphene domains on Cu(100) surface during CVD growth will inevitably lead to densely distributed GBs in the synthesized graphene. Aiming to solve this problem, a simple route, that applies external strain to break the symmetry of the Cu(100) surface, was proposed and proved efficient.
通过化学气相沉积(CVD)制备的石墨烯中的晶界(GBs)极大地降低了石墨烯的电学和力学性能,从而阻碍了石墨烯在电子器件中的应用。石墨烯薄片的无缝拼接可以避免晶界,其中需要石墨烯畴具有相同的取向。在这封信中,通过密度泛函理论(DFT)计算探索了最常用的催化剂表面之一——Cu(100)表面上的石墨烯取向。我们的计算表明,Cu(100)表面上的锯齿形边缘六边形石墨烯畴有两个能量上等效的优选取向,它们彼此相差30度。因此,在CVD生长过程中,Cu(100)表面上的石墨烯畴融合将不可避免地导致合成石墨烯中出现密集分布的晶界。为了解决这个问题,提出并证明了一种简单的方法,即施加外部应变来打破Cu(100)表面的对称性,该方法是有效的。