Methaapanon R, Geyer S M, Hagglund C, Pianetta P A, Bent S F
Department of Chemical Engineering, Stanford University, Stanford, California 94305, USA.
Rev Sci Instrum. 2013 Jan;84(1):015104. doi: 10.1063/1.4773230.
We report the design of a portable atomic layer deposition (ALD) reactor that can be integrated into synchrotron facilities for in situ synchrotron photoemission studies. The design allows for universal installation of the system onto different beam line end stations. The ALD reactor operates as a fully functional, low vacuum deposition system under the conditions of a typical ALD reactor while allowing the samples to be analyzed in an ultrahigh vacuum (UHV) chamber through a quick transfer without vacuum break. This system not only minimizes the exposure of the UHV chamber to the ALD reactants, but it also eliminates the necessity of a beam alignment step after installation. The system has been successfully installed at the synchrotron and tested in the mechanistic studies of platinum ALD following individual half reaction cycles.
