College of Materials Science and Engineering, South China University of Technology, Guangzhou 510641, China.
J Mater Sci Mater Med. 2013 Jun;24(6):1595-603. doi: 10.1007/s10856-013-4897-2. Epub 2013 Mar 2.
A novel tertiary amine containing urethane dimethacrylate monomer UDMTA was synthesized with the aim of replacing Bis-GMA as one component of dental restorative materials. The structure of UDMTA was confirmed by FT-IR and (1)H-NMR spectra. UDMTA was incorporated into Bis-GMA/TEGDMA (50 wt%/50 wt%) resin system to replace Bis-GMA partly and totally. Double bond conversion, polymerization volumetric shrinkage, water sorption and solubility, flexural strength and modulus of UDMTA containing resin formulations were studied with neat Bis-GMA/TEGDMA resin formulation as a reference. Results showed that UDMTA could be used as a coinitiator in photocurable dental resin, UDMTA containing resin had higher double bond conversion and lower polymerization shrinkage than that of Bis-GMA/TEGDMA resin, and the UDMTA containing copolymer had higher flexural strength and flexural modulus than Bis-GMA/TEGDMA copolymer. When UDMTA was used to replace more than 25 wt% of Bis-GMA, the obtained copolymer had higher water sorption and solubility. The optimized resin composition is by replacing 25 wt% of Bis-GMA in Bis-GMA/TEGDMA (50/50 by wt%), for the prepared resin had the best comprehensive properties.
一种新型的含叔胺基的聚氨酯二甲基丙烯酸酯单体 UDMTA 被合成，目的是替代 Bis-GMA 作为牙科修复材料的一种成分。UDMTA 的结构通过 FT-IR 和 (1)H-NMR 光谱得到确认。UDMTA 被掺入 Bis-GMA/TEGDMA（50wt%/50wt%）树脂体系中，以部分或全部替代 Bis-GMA。双键转化率、聚合体积收缩、吸水率和溶解度、弯曲强度和 UDMTA 含树脂配方的模量与纯 Bis-GMA/TEGDMA 树脂配方进行了研究。结果表明，UDMTA 可以用作光固化牙科树脂的共引发剂，UDMTA 含树脂的双键转化率比 Bis-GMA/TEGDMA 树脂高，聚合收缩率低，而 UDMTA 含共聚物的弯曲强度和弯曲模量比 Bis-GMA/TEGDMA 共聚物高。当 UDMTA 取代超过 25wt%的 Bis-GMA 时，得到的共聚物的吸水率和溶解度较高。优化的树脂组成是用 25wt%的 Bis-GMA 替代 Bis-GMA/TEGDMA（50/50wt%）中的 Bis-GMA，因为所制备的树脂具有最佳的综合性能。
