Birck Nanotechnology Center and School of Electrical and Computer Engineering, Purdue University, Indiana 47907, USA.
Small. 2013 Nov 25;9(22):3778-83. doi: 10.1002/smll.201300168. Epub 2013 Apr 18.
Metal nanostructures are the main building blocks of metamaterials and plasmonics which show many extraordinary properties not existing in nature. A simple and widely applicable method that can directly pattern metals with silicon molds without the need of resists, using pressures of <4 MPa and temperatures of 25-150 °C is reported. Three-dimensional structures with smooth and vertical sidewalls, down to sub-10 nm resolution, are generated in silver and gold films in a single patterning step. Using this nanopatterning scheme, large-scale vivid images through extraordinary optical transmission and strong surface-enhanced Raman scattering substrates are realized. Resistless nanoimprinting in metal (RNIM) is a new class of metal patterning that allows plasmonic nanostructures to be fabricated quickly, repeatedly, and at a low-cost.
金属纳米结构是超材料和等离子体学的主要构建块，它们表现出许多自然界中不存在的非凡特性。本文报道了一种简单且广泛适用的方法，该方法无需使用抗蚀剂，仅需使用<4 MPa 的压力和 25-150°C 的温度，即可直接使用硅模具对金属进行图案化。在单个图案化步骤中，在银和金薄膜中生成具有光滑和垂直侧壁的三维结构，分辨率可达亚 10nm。通过这种纳米图案化方案，实现了大尺寸的、通过超常光传输和强表面增强拉曼散射基底产生的逼真图像。无抗蚀剂纳米压印金属（Resistless nanoimprinting in metal，RNIM）是一类新的金属图案化方法，它允许快速、重复且低成本地制造等离子体纳米结构。
