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通过原子层沉积法在介孔硅薄膜中沉积无定形 TiO2,然后通过控制其破碎和晶化,合成均匀分散的锐钛矿纳米粒子。

Synthesis of uniformly dispersed anatase nanoparticles inside mesoporous silica thin films via controlled breakup and crystallization of amorphous TiO2 deposited using atomic layer deposition.

机构信息

Centre for Surface Chemistry and Catalysis, KU Leuven, Kasteelpark Arenberg 23, Leuven B-3001, Belgium.

出版信息

Nanoscale. 2013 Jun 7;5(11):5001-8. doi: 10.1039/c3nr00594a. Epub 2013 May 2.

Abstract

Amorphous titanium dioxide was introduced into the pores of mesoporous silica thin films with 75% porosity and 12 nm average pore diameter via Atomic Layer Deposition (ALD) using alternating pulses of tetrakis(dimethylamino)titanium and water. Calcination provoked fragmentation of the deposited amorphous TiO2 phase and its crystallization into anatase nanoparticles inside the nanoporous film. The narrow particle size distribution of 4 ± 2 nm and the uniform dispersion of the particles over the mesoporous silica support were uniquely revealed using electron tomography. These anatase nanoparticle bearing films showed photocatalytic activity in methylene blue degradation. This new synthesis procedure of the anatase nanophase in mesoporous silica films using ALD is a convenient fabrication method of photocatalytic coatings amenable to application on very small as well as very large surfaces.

摘要

无定形二氧化钛通过原子层沉积(ALD)被引入到具有 75%孔隙率和 12nm 平均孔径的介孔硅薄膜的孔中,使用四(二甲基氨基)钛和水的交替脉冲。煅烧促使沉积的无定形 TiO2 相碎裂,并在纳米多孔薄膜内结晶为锐钛矿纳米粒子。使用电子断层扫描术,独特地揭示了 4±2nm 的窄粒径分布和颗粒在介孔二氧化硅载体上的均匀分散。这些负载有锐钛矿纳米颗粒的薄膜在亚甲基蓝降解中表现出光催化活性。这种使用 ALD 在介孔硅薄膜中合成锐钛矿纳米相的新方法是一种方便的光催化涂层制造方法,适用于非常小和非常大的表面。

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