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GaAs/AlAs超晶格中点缺陷的第一性原理研究:相稳定性及其对能带结构和载流子迁移率的影响

First-Principles Study of Point Defects in GaAs/AlAs Superlattice: the Phase Stability and the Effects on the Band Structure and Carrier Mobility.

作者信息

Jiang Ming, Xiao Haiyan, Peng Shuming, Qiao Liang, Yang Guixia, Liu Zijiang, Zu Xiaotao

机构信息

School of Physics, University of Electronic Science and Technology of China, Chengdu, 610054, China.

Institute of Nuclear Physics and Chemistry, Chinese Academy of Engineering Physics, Mianyang, 621900, China.

出版信息

Nanoscale Res Lett. 2018 Sep 26;13(1):301. doi: 10.1186/s11671-018-2719-7.

Abstract

Advanced semiconductor superlattices play important roles in critical future high-tech applications such as aerospace, high-energy physics, gravitational wave detection, astronomy, and nuclear related areas. Under such extreme conditions like high irradiative environments, these semiconductor superlattices tend to generate various defects that ultimately may result in the failure of the devices. However, in the superlattice like GaAs/AlAs, the phase stability and impact on the device performance of point defects are still not clear up to date. The present calculations show that in GaAs/AlAs superlattice, the antisite defects are energetically more favorable than vacancy and interstitial defects. The As (X = Al or Ga) and X defects always induce metallicity of GaAs/AlAs superlattice, and Ga and Al antisite defects have slight effects on the electronic structure. For GaAs/AlAs superlattice with the interstitial or vacancy defects, significant reduction of band gap or induced metallicity is found. Further calculations show that the interstitial and vacancy defects reduce the electron mobility significantly, while the antisite defects have relatively smaller influences. The results advance the understanding of the radiation damage effects of the GaAs/AlAs superlattice, which thus provide guidance for designing highly stable and durable semiconductor superlattice based electronic and optoelectronics for extreme environment applications.

摘要

先进的半导体超晶格在未来关键的高科技应用中发挥着重要作用,如航空航天、高能物理、引力波探测、天文学以及核相关领域。在诸如高辐射环境等极端条件下,这些半导体超晶格容易产生各种缺陷,最终可能导致器件失效。然而,在像砷化镓/砷化铝这样的超晶格中,点缺陷的相稳定性及其对器件性能的影响至今仍不明确。目前的计算表明,在砷化镓/砷化铝超晶格中,反位缺陷在能量上比空位和间隙缺陷更有利。砷(X = 铝或镓)和X缺陷总是会导致砷化镓/砷化铝超晶格的金属化,而镓和铝反位缺陷对电子结构的影响较小。对于具有间隙或空位缺陷的砷化镓/砷化铝超晶格,发现带隙显著减小或诱导出金属性。进一步的计算表明,间隙和空位缺陷会显著降低电子迁移率,而反位缺陷的影响相对较小。这些结果推进了对砷化镓/砷化铝超晶格辐射损伤效应的理解,从而为设计用于极端环境应用的高度稳定和耐用的基于半导体超晶格的电子和光电器件提供了指导。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/de44/6158148/1bcf3a9183eb/11671_2018_2719_Fig1_HTML.jpg

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