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基于嵌入超薄聚酰亚胺层中的三维受限银量子点的电阻开关存储器。

Resistive switching memory based on three-dimensionally confined Ag quantum dots embedded in ultra thin polyimide layers.

作者信息

Wu Chaoxing, Li Fushan, Guo Tailiang

机构信息

Institute of Optoelectronic Display, Fuzhou University, Fuzhou 350002, People's Republic of China.

出版信息

J Nanosci Nanotechnol. 2013 Feb;13(2):1173-6. doi: 10.1166/jnn.2013.6047.

Abstract

Resistive switching memory devices based on three-dimensionally confined Ag quantum dots (QDs) embedded in polyimide (PI) layers were fabricated by using spin-coating and thermal evaporation. The Ag QDs embedded in PI layer were distributed uniformly with sizes of approximately 4-6 nm and with surface density of approximately 1.25 x 10(11) cm(-2). The electrical properties of the Ag/PI (10 nm)/Ag QDs/PI (10 nm)/Ag devices were investigated at room temperature. Current-voltage (I-V) measurements on the devices showed a counterclockwise electrical hysteresis behavior with reliable and reproducible resistive switching to the existence of the Ag QDs. The memory device transformed from its original high-resistance state to low-resistance state under positive bias, and regained its original high-resistance state under negative bias. The maximum ON/OFF ratio of the current bistability was 1 x 10(4). The device also revealed excellent endurance ability at ambient conditions. The possible operating mechanisms concerning the interaction between Ag QDs and PI matrix for the resistance-transform phenomenon were analyzed on the basis of the I-V results.

摘要

通过旋涂和热蒸发制备了基于嵌入聚酰亚胺(PI)层中的三维受限银量子点(QDs)的电阻开关存储器件。嵌入PI层的银量子点均匀分布,尺寸约为4 - 6纳米,表面密度约为1.25×10¹¹厘米⁻²。在室温下研究了Ag/PI(10纳米)/Ag量子点/PI(10纳米)/Ag器件的电学性质。对器件的电流 - 电压(I - V)测量显示出逆时针电滞回线行为,由于银量子点的存在,电阻开关可靠且可重复。存储器件在正偏压下从其原始高电阻状态转变为低电阻状态,并在负偏压下恢复其原始高电阻状态。电流双稳态的最大开/关比为1×10⁴。该器件在环境条件下还表现出优异的耐久性。基于I - V结果分析了关于银量子点与PI基质之间相互作用导致电阻转变现象的可能操作机制。

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