Wu Chaoxing, Li Fushan, Guo Tailiang
Institute of Optoelectronic Display, Fuzhou University, Fuzhou 350002, People's Republic of China.
J Nanosci Nanotechnol. 2013 Feb;13(2):1173-6. doi: 10.1166/jnn.2013.6047.
Resistive switching memory devices based on three-dimensionally confined Ag quantum dots (QDs) embedded in polyimide (PI) layers were fabricated by using spin-coating and thermal evaporation. The Ag QDs embedded in PI layer were distributed uniformly with sizes of approximately 4-6 nm and with surface density of approximately 1.25 x 10(11) cm(-2). The electrical properties of the Ag/PI (10 nm)/Ag QDs/PI (10 nm)/Ag devices were investigated at room temperature. Current-voltage (I-V) measurements on the devices showed a counterclockwise electrical hysteresis behavior with reliable and reproducible resistive switching to the existence of the Ag QDs. The memory device transformed from its original high-resistance state to low-resistance state under positive bias, and regained its original high-resistance state under negative bias. The maximum ON/OFF ratio of the current bistability was 1 x 10(4). The device also revealed excellent endurance ability at ambient conditions. The possible operating mechanisms concerning the interaction between Ag QDs and PI matrix for the resistance-transform phenomenon were analyzed on the basis of the I-V results.
通过旋涂和热蒸发制备了基于嵌入聚酰亚胺(PI)层中的三维受限银量子点(QDs)的电阻开关存储器件。嵌入PI层的银量子点均匀分布,尺寸约为4 - 6纳米,表面密度约为1.25×10¹¹厘米⁻²。在室温下研究了Ag/PI(10纳米)/Ag量子点/PI(10纳米)/Ag器件的电学性质。对器件的电流 - 电压(I - V)测量显示出逆时针电滞回线行为,由于银量子点的存在,电阻开关可靠且可重复。存储器件在正偏压下从其原始高电阻状态转变为低电阻状态,并在负偏压下恢复其原始高电阻状态。电流双稳态的最大开/关比为1×10⁴。该器件在环境条件下还表现出优异的耐久性。基于I - V结果分析了关于银量子点与PI基质之间相互作用导致电阻转变现象的可能操作机制。