Department of Mechanical Engineering, Yonsei University, 50 Yonsei-ro, Seodaemun-gu, Seoul, South Korea.
Nanoscale. 2013 Jul 7;5(13):6081-7. doi: 10.1039/c3nr34029e. Epub 2013 May 29.
The frictional behavior during manipulation of a single ZnO nanowire with a mass of about 18.7 ng placed horizontally on a Si wafer was examined using atomic force microscopy (AFM). The frictional force measured was in the range of 36.4 nN to 69.3 nN, which corresponded to extremely high friction coefficients of 242 and 462, respectively. However, when the adhesion force of the nanowire was considered, the friction coefficients were similar to the values typically encountered in macro-scale systems. During manipulation of the nanowire, both rolling and sliding motions were observed depending on the nanowire-Si frictional interaction. Unlike macro-scale systems, the difference between the frictional forces of rolling/sliding and pure sliding motions of the nanowire was not drastic.
使用原子力显微镜（AFM）研究了约 18.7ng 重的 ZnO 纳米线在水平放置于硅片上时的操作过程中的摩擦行为。测量到的摩擦力在 36.4nN 到 69.3nN 之间，分别对应于极高的摩擦系数 242 和 462。然而，当考虑纳米线的粘附力时，摩擦系数与宏观系统中通常遇到的值相似。在操纵纳米线时，根据纳米线-硅的摩擦相互作用，观察到滚动和滑动运动。与宏观系统不同，纳米线滚动/滑动和纯滑动运动的摩擦力之间的差异并不明显。
