Institute of Technical Physics, Riga Technical University, 14 Azenes Str, Riga, Latvia.
Nanoscale Res Lett. 2013 Jun 4;8(1):264. doi: 10.1186/1556-276X-8-264.
In this work we study the mechanisms of laser radiation interaction with elementary semiconductors such as Si and Ge and their solid solution SiGe. As a result of this investigation, the mechanisms of nanocones and microcones formation on a surface of semiconductor were proposed. We have shown the possibility to control the size and the shape of cones both by the laser. The main reason for the formation of nanocones is the mechanical compressive stresses due to the atoms' redistribution caused by the gradient of temperature induced by strongly absorbed laser radiation. According to our investigation, the nanocone formation mechanism in semiconductors is characterized by two stages. The first stage is characterized by formation of a p-n junction for elementary semiconductors or of a Ge/Si heterojunction for SiGe solid solution. The generation and redistribution of intrinsic point defects in elementary semiconductors and Ge atoms concentration on the irradiated surface of SiGe solid solution in temperature gradient field take place at this stage due to the thermogradient effect which is caused by strongly absorbed laser radiation. The second stage is characterized by formation of nanocones due to mechanical plastic deformation of the compressed Ge layer on Si. Moreover, a new 1D-graded band gap structure in elementary semiconductors due to quantum confinement effect was formed. For the formation of microcones Ni/Si structure was used. The mechanism of the formation of microcones is characterized by two stages as well. The first stage is the melting of Ni film after irradiation by laser beam and formation of Ni islands due to surface tension force. The second step is the melting of Ni and subsequent manifestations of Marangoni effect with the growth of microcones.
在这项工作中,我们研究了激光辐射与 Si 和 Ge 等元素半导体及其固溶体 SiGe 的相互作用机制。通过这项研究,提出了在半导体表面形成纳米锥和微锥的机制。我们已经展示了通过激光控制锥的尺寸和形状的可能性。纳米锥形成的主要原因是由于温度梯度引起的强烈吸收激光辐射导致的原子重新分布引起的机械压缩应力。根据我们的调查,半导体中纳米锥的形成机制具有两个阶段。第一阶段的特征是形成 p-n 结 elementary 半导体或 SiGe 固溶体的 Ge/Si 异质结。由于强吸收激光辐射引起的热梯度效应,本征点缺陷在 elementary 半导体中的产生和重新分布以及 Ge 原子在温度梯度场中 SiGe 固溶体的辐照表面上的浓度发生在这个阶段。第二阶段的特征是由于 Si 上压缩 Ge 层的机械塑性变形而形成纳米锥。此外,由于量子限制效应,在 elementary 半导体中形成了新的 1D 渐变能带隙结构。对于微锥的形成,使用了 Ni/Si 结构。微锥形成的机制也具有两个阶段。第一阶段是激光辐照后 Ni 膜的熔化以及由于表面张力形成 Ni 岛。第二步是 Ni 的熔化以及随后由于 Marangoni 效应的表现而形成微锥的生长。