Clarendon Laboratory, Department of Physics, University of Oxford, Oxford OX1 3PU, United Kingdom.
Ultramicroscopy. 2013 Oct;133:62-6. doi: 10.1016/j.ultramic.2013.05.005. Epub 2013 May 20.
We report on the fabrication of electrically conducting, ultra-sharp, high-aspect ratio probes for atomic force microscopy by electron-beam-induced deposition of platinum. Probes of 4.0 ±1.0 nm radius-of-curvature are routinely produced with high repeatability and near-100% yield. Contact-mode topographical imaging of the granular nature of a sputtered gold surface is used to assess the imaging performance of the probes, and the derived power spectral density plots are used to quantify the enhanced sensitivity as a function of spatial frequency. The ability of the probes to reproduce high aspect-ratio features is illustrated by imaging a close-packed array of nanospheres. The electrical resistance of the probes is measured to be of order 100 kΩ.
我们报告了通过电子束诱导沉积铂来制造用于原子力显微镜的导电、超尖锐、高纵横比探针的方法。通常可以以高重复性和接近 100%的产率制备曲率半径为 4.0±1.0nm 的探针。使用溅射金表面的颗粒性质的接触模式形貌成像来评估探针的成像性能，并且衍生的功率谱密度图用于定量地表示作为空间频率函数的增强的灵敏度。通过对密排纳米球阵列进行成像来演示探针重现高纵横比特征的能力。测量探针的电阻约为 100kΩ。
