Nano Photonics Laboratory, School of Mechanical Engineering, Yonsei University, 50 Yonsei-ro, Seodaemun-gu, Seoul, South Korea.
Opt Lett. 2013 Jul 1;38(13):2250-2. doi: 10.1364/OL.38.002250.
We propose a scheme of overlay alignment for plasmonic lithography using a scanning contact probe. Using two resonances of a ridge aperture in a metal film, we introduce the aperture's multifunctional characteristics for patterning and alignment at different wavelengths. To verify this idea, we measure an image of an alignment mark using a scanning ridge aperture and determine the reference point for the alignment. We then analyze the uncertainty of the alignment method with respect to the image data noise and compare the numerical results with the experimental results. The uncertainty of the overlay alignment method is shown to be less than approximately 2 nm.
我们提出了一种使用扫描接触探针的等离子体光刻覆盖对准方案。利用金属膜中脊形孔径的两个共振，我们为不同波长的图案化和对准引入了孔径的多功能特性。为了验证这个想法，我们使用扫描脊形孔径测量了对准标记的图像，并确定了对准的参考点。然后，我们分析了图像数据噪声对对准方法的不确定性，并将数值结果与实验结果进行了比较。结果表明，覆盖对准方法的不确定性小于约 2nm。
