Zhang Jinlong, Xie Yujiang, Cheng Xinbin, Jiao Hongfei, Wang Zhanshan
Key Laboratory of Advanced Microstructure Materials, Ministry of Education, Shanghai, China.
Appl Opt. 2013 Aug 10;52(23):5788-93. doi: 10.1364/AO.52.005788.
We proposed an analytical method to design optical minus filters by the thickness modulation of discrete, homogeneous thin-film layers of a two-material multilayer coating. The main stack provides the narrow, second-order rejection band, and the correct thickness-modulation apodization and match layers can effectively suppress the sidelobes of the passband. Using this approach, we can design minus filters with layer thicknesses close to half-wave of the rejection wavelength, making this method well suited for accurate monitoring during the deposition.
我们提出了一种分析方法，通过对由两种材料构成的多层涂层的离散均匀薄膜层进行厚度调制来设计光学减光滤光片。主堆叠提供狭窄的二阶抑制带，正确的厚度调制变迹和匹配层可以有效抑制通带的旁瓣。使用这种方法，我们可以设计出层厚度接近抑制波长半波的减光滤光片，使得该方法非常适合在沉积过程中进行精确监测。
