Sametoglu Vahit, Sauer Vincent T K, Tsui Ying Y
Department of Electrical and Computer Engineering, University of Alberta, ECERF 2nd Floor, Edmonton, AB, T6G 2V4, Canada.
Opt Express. 2013 Jul 29;21(15):18525-31. doi: 10.1364/OE.21.018525.
The effect of donor film thickness and laser beam fluence on the size of laser-induced forward transfer (LIFT) spots is studied to achieve sub-100 nm features. A 130 fs, 800 nm laser is focused on ultrathin Cr films, and the transfer and ablation thresholds of these films at various thicknesses are determined. The minimum transfer spot size decreases with decreasing donor film thickness and incident laser fluence. Minimum LIFT spots of 70-450 nm diameter are obtained from films of 20-80 nm thickness, respectively. The 70 nm diameter transfer spots obtained from sputtered continuous films are the smallest to date.
研究了供体薄膜厚度和激光束能量密度对激光诱导正向转移（LIFT）光斑尺寸的影响，以实现小于100纳米的特征。将一束130飞秒、800纳米的激光聚焦在超薄铬膜上，并确定了这些不同厚度薄膜的转移和烧蚀阈值。最小转移光斑尺寸随着供体薄膜厚度和入射激光能量密度的减小而减小。分别从厚度为20 - 80纳米的薄膜中获得了直径为70 - 450纳米的最小LIFT光斑。从溅射连续薄膜中获得的直径70纳米的转移光斑是迄今为止最小的。
